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CMOS Plasma and Process Damage

CMOS Plasma and Process Damage

Hardcover

Technology & EngineeringGeneral ComputersPhysics

ISBN10: 3031890280
ISBN13: 9783031890284
Publisher: Springer
Published: May 17 2025
Pages: 466
Weight: 1.89
Height: 1.06 Width: 6.14 Depth: 9.21
Language: English

This book discusses the complex technology of building CMOS computer chips and covers some of the unusual problems that can occur during chip manufacturing. Readers will learn how plasma and process damage results from the high-energy processes that are used in chip manufacturing, causing harm to the chips, functional failure and reliability problems.

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Prall, Kirk

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Technology & Engineering