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CMOS Plasma and Process Damage

CMOS Plasma and Process Damage

Paperback

Technology & EngineeringGeneral ComputersPhysics

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ISBN10: 3031890310
ISBN13: 9783031890314
Publisher: Springer
Published: May 18 2026
Pages: 466
Language: English

This book discusses the complex technology of building CMOS computer chips and covers some of the unusual problems that can occur during chip manufacturing. Readers will learn how plasma and process damage results from the high-energy processes that are used in chip manufacturing, causing harm to the chips, functional failure and reliability problems.

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Prall, Kirk

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Technology & Engineering