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    Alley-side Pickup: 10am - 7pm

    3038 Hennepin Ave Minneapolis, MN
    612-822-4611

Open Daily: 10am - 10pm | Alley-side Pickup: 10am - 7pm
3038 Hennepin Ave Minneapolis, MN
612-822-4611
Ultra-Fast Silicon Bipolar Technology

Ultra-Fast Silicon Bipolar Technology

Treitinger, Ludwig
Miura-Mattausch, Mitiko

Paperback

Series: Springer Electronics and Photonics, Book 27

Technology & Engineering

ISBN10: 3642743625
ISBN13: 9783642743627
Publisher: Springer Nature
Published: Dec 21 2011
Pages: 167
Weight: 0.59
Height: 0.39 Width: 6.14 Depth: 9.21
Language: English
Since the first bipolar transistor was investigated in 1947, enormous efforts have been devoted to semiconductor devices. The strong world- wide competition in fabricating metal-oxide-semiconductor field-effect of develop- transistor (MOSFET) memories has accelerated the pace ments in semiconductor technology. Bipolar transistors play a major role due to their high-speed performance. Delay times of about 20 ps per gate have already been achieved. Because of this rapid technologi- cal progress, it is difficult to predict the future with any certainty. In 1987 a special session on ultrafast bipolar transistors was held at the European Solid-State Device Research Conference. Its aim was to sum- marize the most recent developments and to discuss the future of bip- olar transistors. This book is based on that session but also includes contributions by other participants, such that a broad range of up-to- is presented. Several conclusions can be drawn from date information this information: the first and most important is the very large poten- tial for future progress still existing in this field. This progress is char- acterized by the drive towards higher speed and lower power con- sumption required for complex single-chip systems, as well as by sev- eral concrete technological implementations for fulfilling these dem- is that a large part of this potential can be ands. The second conclusion realized by rather unsophisticated techniques and configurations well suited to uncomplicated transfer to fabrication.

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