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3038 Hennepin Ave Minneapolis, MN
612-822-4611
Silicon Micromachining

Silicon Micromachining

Paperback

Series: Cambridge Studies in Semiconductor Physics and Microelectron, Book 7

Technology & Engineering

ISBN10: 0521607671
ISBN13: 9780521607674
Publisher: Cambridge University Press
Published: Aug 19 2004
Pages: 420
Weight: 1.67
Height: 0.91 Width: 7.38 Depth: 9.62
Language: English
This comprehensive book provides an overview of the key techniques used in the fabrication of micron-scale structures in silicon. Recent advances in these techniques have made it possible to create a new generation of microsystem devices, such as microsensors, accelerometers, micropumps, and miniature robots. The authors underpin the discussion of each technique with a brief review of the fundamental physical and chemical principles involved. They pay particular attention to methods such as isotropic and anisotropic wet chemical etching, wafer bonding, reactive ion etching, and surface micromachining. There is a special section on bulk micromachining, and the authors also discuss release mechanisms for movable microstructures. The book is a blend of detailed experimental and theoretical material, and will be of great interest to graduate students and researchers in electrical engineering and materials science whose work involves the study of micro-electromechanical systems (MEMS).

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