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Photomask Fabrication Technology

Photomask Fabrication Technology

Hardcover

Technology & Engineering

ISBN10: 0071445633
ISBN13: 9780071445634
Publisher: McGraw-Hill Companies
Published: Aug 1 2005
Pages: 500
Weight: 2.03
Height: 1.75 Width: 6.16 Depth: 9.28
Language: English
Publisher's Note: Products purchased from Third Party sellers are not guaranteed by the publisher for quality, authenticity, or access to any online entitlements included with the product.


Photomasks are defect-free optical templates -- the printing masters for the fabrication of integrated circuits (ICs). When IC feature sizes fall below the exposure tool's source wavelength, photomask fabrication becomes difficult: very strict mask critical dimension (CD) and feature placement specifications, intensive capital equipment investment, unique raw materials and applications, and special expertise requirements for photomask fabrication technologists are necessary to fabricate modern microelectronics. Thus the rapid recent growth of the field and the need for this book.

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