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Plasma Etching: Fundamentals and Applications

Plasma Etching: Fundamentals and Applications

Hardcover

Series: Semiconductor Science and Technology, Book 7

Technology & EngineeringPhysics

ISBN10: 019856287X
ISBN13: 9780198562870
Publisher: OUP Oxford
Published: Jul 30 1998
Pages: 356
Weight: 1.50
Height: 0.81 Width: 6.14 Depth: 9.21
Language: English
This book focuses on the remarkable recent advances in understanding low pressure radio frequency glow discharges. It explains the basic analytical theory, plasma physics, and plasma diagnostics, before proceeding to the details of the etching process.

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