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    Alley-side Pickup: 10am - 7pm

    3038 Hennepin Ave Minneapolis, MN
    612-822-4611

Open Daily: 10am - 10pm | Alley-side Pickup: 10am - 7pm
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Photovoltaic Power Generation: Proceedings of the Second Contractors' Meeting Held in Hamburg, 16-18 September 1987

Photovoltaic Power Generation: Proceedings of the Second Contractors' Meeting Held in Hamburg, 16-18 September 1987

Caratti, G.
Van Overstraeten, R.

Paperback

Series: Solar Energy and Development, Book 3

Technology & EngineeringGeneral Science

ISBN10: 9401078211
ISBN13: 9789401078214
Publisher: Springer Nature
Published: Apr 2 2012
Pages: 320
Weight: 1.00
Height: 0.68 Width: 6.14 Depth: 9.21
Language: English
Amorphous silicon PV panel mass production will require to mas- ter plasma chemical deposition in terms of large sizes, cost, maintenance and all other problems related to industrialization. Since plasma deposition is a novel technique, the development of all this production related know how involves a considerable technical research effort. The major problems related to the design of a production deposi- tion machine are the following - deposition should be uniform on very large area substrate (typical dimension 1 meter); - the deposited amorphous silicon should have good electronic properties (density of state of the order or less than 16 3 10 cm /eV) and very low impurities concentrations (for exam- ple oxygen atomic concentration should idealy be less than 0. 01 %); - the film stress should be limited, the density of ponctual defects (particulates) should remain reasonable (less than 2 per 100 cm ); - dopant level control should be stable and efficient; - silane consumption should remain reasonably efficient - financial cost being important the machine productivity should be high hence deposition rate optimized; - downtime due to maintenance should be reduced to a minimum. We present here some results on the R&D effort addressed to the above mentioned problems. An original single chamber was designed. This machine will be made available on the market for R&D purposes by a process machine company. Finally the maintenance problem is considered. Plasma cleaning based on a fluorine containing etchant gases is studied and evaluated. 2.

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