Open Daily: 10am - 10pm | Alley door pickup 10am - 7pm 3038 Hennepin Ave Minneapolis, MN
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  • Open Daily: 10am - 10pm
    Alley-side Pickup: 10am - 7pm

    3038 Hennepin Ave Minneapolis, MN
    612-822-4611

Open Daily: 10am - 10pm | Alley-side Pickup: 10am - 7pm
3038 Hennepin Ave Minneapolis, MN
612-822-4611
Micromirror Technology for Maskless Lithography

Micromirror Technology for Maskless Lithography

Chen, Yijian

Paperback

Technology & Engineering

ISBN10: 3639513657
ISBN13: 9783639513653
Publisher: Blues Kids Of Amer
Published: Aug 21 2013
Pages: 156
Weight: 0.52
Height: 0.36 Width: 6.00 Depth: 9.00
Language: English
This book presents a complete analysis and review of dynamics, control and fabrication of MEMS micromirrors for applications in DUV and EUV maskless lithography. The transient and resonant behavior of various types of electro-mechanically damped micromirrors with various degrees of freedom are discussed. The theoretical approach using the perturbation method and linear control theory is described. Micromirror design and fabrication issues including the material properties, process integration, and device reliability are addressed. Novel processing solutions such as the self-aligned spacer patterning technique to define nano-scale actuation gaps for low-voltage operation are introduced. Fabrication results of highly complicated 3-D MEMS devices such as vertical-comb tilting micromirrors and double-flexure piston micromirrors are demonstrated. This book serves as an excellent in-depth source of MEMS dynamics, control, and fabrication knowledge for both graduate students and experienced researchers.

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