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612-822-4611
Materials and Processes for Next Generation Lithography: Volume 11

Materials and Processes for Next Generation Lithography: Volume 11

Hardcover

Series: Frontiers of Nanoscience, Book 11

Technology & EngineeringChemistry

ISBN10: 0081003544
ISBN13: 9780081003541
Publisher: Elsevier
Published: Nov 19 2016
Pages: 634
Weight: 2.86
Height: 1.38 Width: 7.50 Depth: 9.25
Language: English

As the requirements of the semiconductor industry have become more demanding in terms of resolution and speed it has been necessary to push photoresist materials far beyond the capabilities previously envisioned. Currently there is significant worldwide research effort in to so called Next Generation Lithography techniques such as EUV lithography and multibeam electron beam lithography.

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Technology & Engineering