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Long-Term Reliability of Nanometer VLSI Systems: Modeling, Analysis and Optimization

Long-Term Reliability of Nanometer VLSI Systems: Modeling, Analysis and Optimization

Paperback

Technology & EngineeringGeneral Computers

ISBN10: 3030261743
ISBN13: 9783030261740
Publisher: Springer Nature
Published: Sep 25 2020
Pages: 460
Weight: 1.54
Height: 1.01 Width: 6.14 Depth: 9.21
Language: English
This book provides readers with a detailed reference regarding two of the most important long-term reliability and aging effects on nanometer integrated systems, electromigrations (EM) for interconnect and biased temperature instability (BTI) for CMOS devices. The authors discuss in detail recent developments in the modeling, analysis and optimization of the reliability effects from EM and BTI induced failures at the circuit, architecture and system levels of abstraction. Readers will benefit from a focus on topics such as recently developed, physics-based EM modeling, EM modeling for multi-segment wires, new EM-aware power grid analysis, and system level EM-induced reliability optimization and management techniques.

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