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Interconnect Noise Optimization in Nanometer Technologies

Interconnect Noise Optimization in Nanometer Technologies

Paperback

Technology & EngineeringGeneral Computers

ISBN10: 1441938443
ISBN13: 9781441938442
Publisher: Springer Nature
Published: Oct 29 2010
Pages: 137
Weight: 0.52
Height: 0.50 Width: 6.00 Depth: 8.90
Language: English

This book provides insight into the use of CAD for layout analysis and optimization of interconnect in high speed, high complexity integrated circuits, which have become the dominating factor in determining system performance in nanometer technologies. The text investigates the effects on system performance and reliability of wire size, spacing, wire length, coupling length, load capacitance, rise time of the inputs, place of overlap, frequency, shields, signal direction and wire width for both the aggressors and the victim wires. The authors present a range of CAD algorithms and techniques for synthesizing and optimizing interconnect.

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