• Open Daily: 10am - 10pm
    Alley-side Pickup: 10am - 7pm

    3038 Hennepin Ave Minneapolis, MN
    612-822-4611

Open Daily: 10am - 10pm | Alley-side Pickup: 10am - 7pm
3038 Hennepin Ave Minneapolis, MN
612-822-4611
High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications

High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications

Paperback

Technology & Engineering

ISBN10: 0128124547
ISBN13: 9780128124543
Publisher: Elsevier
Published: Aug 30 2019
Pages: 398
Weight: 1.17
Height: 0.82 Width: 6.00 Depth: 9.00
Language: English

High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications is an in-depth introduction to HiPIMS that emphasizes how this novel sputtering technique differs from conventional magnetron processes in terms of both discharge physics and the resulting thin film characteristics. Ionization of sputtered atoms is discussed in detail for various target materials. In addition, the role of self-sputtering, secondary electron emission and the importance of controlling the process gas dynamics, both inert and reactive gases, are examined in detail with an aim to generate stable HiPIMS processes.

Also in

Technology & Engineering