Open Daily: 10am - 10pm | Alley door pickup 10am - 7pm 3038 Hennepin Ave Minneapolis, MN
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  • Open Daily: 10am - 10pm
    Alley-side Pickup: 10am - 7pm

    3038 Hennepin Ave Minneapolis, MN
    612-822-4611

Open Daily: 10am - 10pm | Alley-side Pickup: 10am - 7pm
3038 Hennepin Ave Minneapolis, MN
612-822-4611
Handbook of Photomask Manufacturing Technology

Handbook of Photomask Manufacturing Technology

Rizvi, Syed

Hardcover

Technology & Engineering

ISBN10: 0824753747
ISBN13: 9780824753740
Publisher: CRC Press
Published: Mar 1 2005
Pages: 728
Weight: 3.15
Height: 1.53 Width: 7.20 Depth: 10.30
Language: English
As the semiconductor industry attempts to increase the number of functions that will fit into the smallest space on a chip, it is increasingly important for new technologies to keep pace with these demands. Photomask technology is one of the key areas to achieving this goal. This valuable reference provides a comprehensive summary of all areas of mask technology in a single work, featuring contributions from 40 internationally reputable authors from industry, academia, government, national labs, and consortia. They discuss conventional masks and their supporting technologies, as well as next-generation technologies such as extreme ultraviolet, electron projection, ion projection, and X-ray lithography.

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