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Film Deposition by Plasma Techniques

Film Deposition by Plasma Techniques

Paperback

Series: Springer Atomic, Optical, and Plasma Physics, Book 10

Technology & EngineeringPhysics

ISBN10: 3642845134
ISBN13: 9783642845130
Publisher: Springer Nature
Published: Dec 15 2011
Pages: 224
Weight: 0.75
Height: 0.51 Width: 6.14 Depth: 9.21
Language: English
Plasma deposition techniques are of major importance because they can be used to produce high-quality thin films for applications in device technology. This introduction to the subject contains sufficient details of the foundations of plasma science to be useful to newcomers to the field and, at the same time, ample information about specific techniques and new results, so that established researchers will also find it of interest.

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