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Atomic Layer Deposition 2e

Atomic Layer Deposition 2e

Hardcover

Technology & Engineering

ISBN10: 1118062779
ISBN13: 9781118062777
Publisher: John Wiley & Sons
Published: May 17 2013
Pages: 272
Weight: 1.25
Height: 0.90 Width: 6.10 Depth: 9.30
Language: English
Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.

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Technology & Engineering