Open Daily: 10am - 10pm | Alley door pickup 10am - 7pm 3038 Hennepin Ave Minneapolis, MN
612-822-4611

  • Open Daily: 10am - 10pm
    Alley-side Pickup: 10am - 7pm

    3038 Hennepin Ave Minneapolis, MN
    612-822-4611

Open Daily: 10am - 10pm | Alley-side Pickup: 10am - 7pm
3038 Hennepin Ave Minneapolis, MN
612-822-4611
Thin Film Fluid Flow Simulation on Rotating Discs

Thin Film Fluid Flow Simulation on Rotating Discs

Víta, Petr

Paperback

General Science

Currently unavailable to order

ISBN10: 383815360X
ISBN13: 9783838153605
Publisher: Omniscriptum
Published: Mar 22 2017
Pages: 224
Weight: 0.74
Height: 0.51 Width: 6.00 Depth: 9.00
Language: English
Prediction and analysis of complex industrial processes depend on accurate modelling of physical phenomena. One particular group of them, free-surface liquid film flows on spinning discs, forms a central piece of many industrial processes, for example a wet chemical wafer etching, a coating etc. This work presents a series of numerical studies of the film flow with an impinging jet on rotating discs which is the basis for a high performance simulation tool. Numerical studies based on the Volume-of-Fluid (VoF) method were performed and evaluated against reported experimental data. The conclusion drawn is that a transient two-phase 3D free-surface VoF-simulation is impractical for an industrial use due to time constraints. A thin film model based on an integral method is proposed as a possible remedy. The model was implemented in the open-source software toolkit OpenFOAM using the Finite Area method. The approach is validated with the ANSYS Fluent software and its VoF-implementation. An extension of the model with a simple diffusion-controlled chemistry model for a wet chemical etching of silicon wafers is presented.

Also in

General Science

View All