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Semiconductor Strain Metrology: Principles and Applications

Semiconductor Strain Metrology: Principles and Applications

Paperback

General Science

ISBN10: 160805554X
ISBN13: 9781608055548
Publisher: Bentham Science Pub
Published: Feb 1 2018
Pages: 144
Weight: 1.06
Height: 0.37 Width: 8.50 Depth: 11.00
Language: English
This book surveys the major and newly developed techniques for semiconductor strain metrology. Semiconductor strain metrology has emerged in recent years as a topic of great interest to researchers involved in thin film and nanoscale device characterization. This book employs a tutorial approach to explain the principles and applications of each technique specifically tailored for graduate students and postdoctoral researchers. Selected topics include optical, electron beam, ion beam and synchrotron x-ray techniques. Unlike earlier references, this book specifically discusses strain metrology as applied to semiconductor devices with both depth and focus.

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