Open Daily: 10am - 10pm | Alley door pickup 10am - 7pm 3038 Hennepin Ave Minneapolis, MN
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  • Open Daily: 10am - 10pm
    Alley-side Pickup: 10am - 7pm

    3038 Hennepin Ave Minneapolis, MN
    612-822-4611

Open Daily: 10am - 10pm | Alley-side Pickup: 10am - 7pm
3038 Hennepin Ave Minneapolis, MN
612-822-4611
Extreme Ultraviolet Lithography

Extreme Ultraviolet Lithography

Kinoshita, Hiroo Kinoshita

Paperback

Physics

ISBN10: 6630122445
ISBN13: 9786630122442
Publisher: LAP Lambert Academic Publishing
Published: Jun 30 2026
Pages: 168
Weight: 0.51
Height: 0.39 Width: 6.00 Depth: 9.00
Language: English
This book provides a comprehensive introduction to the principles, history, and core technologies of extreme ultraviolet lithography (EUVL), the semiconductor manufacturing technology that has enabled continued device scaling. It explains why EUVL was pursued, why a wavelength of 13.5 nm was selected, and how its key components including reflective optics, Mo/Si multilayer mirrors, masks, light sources, and resist materials were developed. The book also traces the evolution of EUVL from early research to high-volume manufacturing, highlighting the breakthroughs in multilayer coatings, ultra-precise aspherical mirror fabrication, and sub-nanometer metrology that made the technology practical. It concludes with the performance of modern production tools and the successful adoption of EUVL for advanced semiconductor fabrication at the 7 nm technology node and beyond.

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