Open Daily: 10am - 10pm | Alley door pickup 10am - 7pm 3038 Hennepin Ave Minneapolis, MN
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  • Open Daily: 10am - 10pm
    Alley-side Pickup: 10am - 7pm

    3038 Hennepin Ave Minneapolis, MN
    612-822-4611

Open Daily: 10am - 10pm | Alley-side Pickup: 10am - 7pm
3038 Hennepin Ave Minneapolis, MN
612-822-4611
Efficient Extreme Ultraviolet Mirror Design: An FDTD approach

Efficient Extreme Ultraviolet Mirror Design: An FDTD approach

Lee, Yen-Min

Hardcover

Series: Iop Advances in Optics, Photonics and Optoelectronics

Physics

ISBN10: 0750326506
ISBN13: 9780750326506
Publisher: Institute of Physics Publishing
Published: Sep 23 2021
Pages: 150
Weight: 0.92
Height: 0.31 Width: 7.00 Depth: 10.00
Language: English

Extreme ultraviolet (EUV) lithography is a next generation platform with the potential to extend Moore's Law. The EUV mirror is a fundamental component of this system. Efficient Extreme Ultraviolet Mirror Design describes an approach to designing EUV mirrors with reduced computational time and memory requirements, providing a comprehensive grounding in the fundamentals of the EUV mirror and knowledge of the finite-difference time-domain (FDTD) method. The discussion is made timely by the opening of commercial avenues for the application of EUV as it begins to be implemented in the development of 5G, AI, edge computing, VR and the Internet of Things. This book explores the theory, function and fabrication of EUV mirrors, as well as the correlation between design by Fresnel's equations and design by photonic bands, and develops a rigorous and efficient FDTD method by applying these considerations to three simulation cases.

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