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  • Open Daily: 10am - 10pm
    Alley-side Pickup: 10am - 7pm

    3038 Hennepin Ave Minneapolis, MN
    612-822-4611

Open Daily: 10am - 10pm | Alley-side Pickup: 10am - 7pm
3038 Hennepin Ave Minneapolis, MN
612-822-4611
Exploration of Focused Ion Beam Processing

Exploration of Focused Ion Beam Processing

Tripathi, Sarvesh K.

Paperback

Physics

ISBN10: 3847333097
ISBN13: 9783847333098
Publisher: Lap Lambert Academic Pub
Published: Dec 29 2011
Pages: 156
Weight: 0.52
Height: 0.36 Width: 6.00 Depth: 9.00
Language: English
The necessity of miniaturization of the devices expands the scope of nanotechnology. In recent years, researchers have poured in a lot of effort in the development of nanoscale devices. The focused ion beam (FIB) has proven itself as a very powerful and unique technique for nanofabrication. FIB induced micro / nanofabrication fundamentally involves two basic phenomena namely sputtering and molecular cracking, leading to the material removal and material deposition, respectively. In the present work the basic physical processes involved in the FIB induced deposition have been investigated and the correlation between ion beam parameters and physical characteristics of FIB fabricated nanostructures has been studied. There are a number of other physical phenomena viz. scattering, redeposition, secondary electron / photon emission and localized heating etc. which may occur when the incident ions interact with the substrate during the FIB processing, and intricately influence the nanofabrication. Therefore, it is very necessary to investigate the effect of these phenomena for efficient FIB processing. In the present work the influences of these physical phenomena have been explored.

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