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612-822-4611
Advances in Chemical Vapor Deposition

Advances in Chemical Vapor Deposition

Hardcover

Chemistry

ISBN10: 3039439235
ISBN13: 9783039439232
Publisher: Mdpi Ag
Published: Jan 15 2021
Pages: 94
Weight: 0.90
Height: 0.38 Width: 6.69 Depth: 9.61
Language: English

Pursuing a scalable production methodology for materials and advancing it from the laboratory to industry is beneficial to novel daily-life applications. From this perspective, chemical vapor deposition (CVD) offers a compromise between efficiency, controllability, tunability and excellent run-to-run repeatability in the coverage of monolayers on substrates. Hence, CVD meets all of the requirements for industrialization in basically all areas, including polymer coatings, metals, water-filtration systems, solar cells and so on. The Special Issue Advances in Chemical Vapor Deposition is dedicated to providing an overview of the latest experimental findings and identifying the growth parameters and characteristics of perovskites, TiO2, Al2O3, VO2 and V2O5 with desired qualities for potentially useful devices.

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Chemistry